Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
Vacuum evaporation — is the process of causing the pressure in a container to fall until water s boiling point has been lowered to room temperature. When the process is applied to food and the water is evaporated and removed, the food can be stored for long periods… … Wikipedia
Vacuum — This article is about empty physical space or the absence of matter. For other uses, see Vacuum (disambiguation). Free space redirects here. For other uses, see Free space (disambiguation). Pump to demonstrate vacuum In everyday usage, vacuum is… … Wikipedia
méthode de déposition sous vide — vakuuminio nusodinimo būdas statusas T sritis radioelektronika atitikmenys: angl. vacuum deposition technique vok. Vakuumaufdampfungstechnik, f rus. способ вакуумного осаждения, m pranc. méthode de déposition sous vide, f … Radioelektronikos terminų žodynas
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… … Wikipedia
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Pulsed laser deposition — (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the desired composition. Material is then vaporized from the… … Wikipedia
Ultra high vacuum — (UHV) is the vacuum regime characterised by pressures lower than about 10−7 pascal or 100 nanopascals ( 10−9 torr). UHV requires the use of special materials in creating the vacuum system, extreme cleanliness to maintain the vacuum system, and… … Wikipedia
